Plasma-assisted formation of low defect density silicon carbide-silicon dioxide, SiCSiO2, interfaces

✍ Scribed by A. Gölz; G. Lucovsky; K. Koh; D. Wolfe; H. Niimi; H. Kurz

• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 349 KB
• Volume: 36
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(97)00018-x