✦ LIBER ✦
Plasma and fluorocarbon-gas free Si dry etching process using a Cat-CVD system
✍ Scribed by Akira Izumi; Hidekazu Sato; Shingi Hashioka; Manabu Kudo; Hideki Matsumura
- Book ID
- 114156024
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 536 KB
- Volume
- 51-52
- Category
- Article
- ISSN
- 0167-9317
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