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Physically based quantum-mechanical compact model of MOS devices substrate-injected tunneling current through ultrathin (EOT ∼ 1 nm) SiO2 and high-κ gate stacks

✍ Scribed by Fei Li; Mudanai, S.P.; Yang-Yu Fan; Register, L.F.; Banerjee, S.K.


Book ID
114618225
Publisher
IEEE
Year
2006
Tongue
English
Weight
429 KB
Volume
53
Category
Article
ISSN
0018-9383

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