✦ LIBER ✦
Physical modelling of the enhanced diffusion of boron due to ion implantation in thin-base npn bipolar transistors
✍ Scribed by M. Mouis; H.J. Gregory; S. Denorme; D. Mathiot; P. Ashburn; D.J. Robbins; J.L. Glasper
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 348 KB
- Volume
- 26
- Category
- Article
- ISSN
- 0026-2692
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