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Physical model for the evolution of the defect system of silicon carbide with allowance for the internal elastic stress fields during implantation of Al+and N+and subsequent annealing

✍ Scribed by D. V. Kulikov; Yu. V. Trushin; P. V. Rybin; V. S. Kharlamov


Book ID
110121294
Publisher
Springer
Year
1999
Tongue
English
Weight
103 KB
Volume
44
Category
Article
ISSN
1063-7842

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