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Photosensitivity of SiO2–Al and SiO2–Na glasses under ArF (193 nm) laser

✍ Scribed by A.N. Trukhin; J. Teteris; A. Fedotov; D.L. Griscom; G. Buscarino

No coin nor oath required. For personal study only.

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Photosensitivity of SiO2–Al and SiO2–Na glasses under ArF (193&#xa0;nm) laser