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Photosensitivity of Functional Polystyrene and Poly(methyl methacrylate) Synthesized by Controlled Radical Polymerization

✍ Scribed by Chan, Suk Hang; Lam, Lillian Sze Man; Tse, Chui Wan; Man, Ka Yan Kitty; Wong, Wing Tak; Djurišić, Aleksandra B.; Chan, Wai Kin

Book ID
126250016
Publisher
American Chemical Society
Year
2003
Tongue
English
Weight
188 KB
Volume
36
Category
Article
ISSN
0024-9297

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## Abstract The triazoline derivative 1 was used as an additive in the chain‐growth controlled radical polymerization of vinylic monomers to afford narrowly distributed polymers. This new system is applicable to styrene as well as to methacrylates. The monomer consumption and the variation of the m