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Photosensitivity in phosphorus-doped silica glass and optical waveguides

โœ Scribed by Malo, B.; Albert, J.; Bilodeau, F.; Kitagawa, T.; Johnson, D. C.; Hill, K. O.; Hattori, K.; Hibino, Y.; Gujrathi, S.


Book ID
121215852
Publisher
American Institute of Physics
Year
1994
Tongue
English
Weight
729 KB
Volume
65
Category
Article
ISSN
0003-6951

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UV photosensitivity of Ge-doped silica films deposited on Si (1 0 0) substrates using flame hydrolysis deposition (FHD) has been investigated. The ratio of Ge and Si of the sample was estimated by XPS as 10:90, and it was shown by AFM as smooth and homogeneous. It seems to have not germanium oxygen