Poly(p-chlorostyrene), PCSt, and poly(p-chloro-a-methylstyrene), PCaMSt, are much less photosensitive than low molecular model compounds. The quantum yield of HCI formation $(HCI) -0.01 is much lower than 4(HCI) -0.18 determined for I-chloro-4-isopropylbenzene and l-t-butyl-4-chlorobenzene. The pre
Photolysis of poly(p-methylstyrene)
โ Scribed by N. A. Weir
- Publisher
- John Wiley and Sons
- Year
- 1973
- Tongue
- English
- Weight
- 806 KB
- Volume
- 17
- Category
- Article
- ISSN
- 0021-8995
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๐ SIMILAR VOLUMES
A poly(p-methylstyrene)-block-polyisoprene-block-poly(p-methyl styrene) thermoplastic elastomer was synthesized via anionic polymerization using n-butyllithium as an initiator. The sequential method used for the synthesis has resulted in a nearly monodispersed polymer with a polydispersity of 1.02.
The photodegradation of films of poly(pisopropyl styrene) with 254nm radiation at 10 -~ mbar and 25 + I ยฐ has been studied. The principal product is hydrogen but smaller quantities of methane and ethane and a trace of propane are also formed, indicating that the p-substituent also undergoes decompos
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The miscibility of poly(chloromethyl methacrylate) (PCMMA) with poly(ยฃ)-methylstyrene-co-acrylonitrile) (~MSAN) of various compositions was studied by differential scanning calbrimetry. PCM~A is miscible with ~MSAN over a composition range of ~3-42 wt% AN. The phase behaviour allows evaluation of tw