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Photolysis of glyoxal at 193, 248, 308 and 351 nm

✍ Scribed by Lei Zhu; Daniel Kellis; Chuan-Fan Ding

Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 387 KB
Volume: 257
Category: Article
ISSN: 0009-2614
DOI: 10.1016/0009-2614(96)00570-2

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✦ Synopsis

The UV photochemistry of glyoxal in nitrogen has been investigated by employing excimer laser photolysis at 193, 248, 308 and 351 nm in combination with cavity ring-down spectroscopy. The HCO radical was a photofragmentation product with yields of 0.42 4-0.21, 0.53 4-0.24, 0.69 + 0.29, and 1.5 4-0.6 at 193, 248, 308 and 351 nm. The larger than unity HCO yield at 351 nm suggests the photolysis channel (CHO) 2 + hv (351 nm)---)2HCO. The decrease in HCO yields at higher photolysis photon energies is attributed to the opening up of additional glyoxal photolysis pathways.

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