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Photoemission studies of reactive diffusion and localized doping at II–VI compound semiconductor-metal interfaces

✍ Scribed by N.G. Stoffel; R. Daniels; L.J. Brillson; C.F. Brucker; A. Katnani; G. Margaritondo


Publisher
Elsevier Science
Year
1983
Weight
236 KB
Volume
117-118
Category
Article
ISSN
0378-4363

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