Poly(p-chlorostyrene), PCSt, and poly(p-chloro-a-methylstyrene), PCaMSt, are much less photosensitive than low molecular model compounds. The quantum yield of HCI formation $(HCI) -0.01 is much lower than 4(HCI) -0.18 determined for I-chloro-4-isopropylbenzene and l-t-butyl-4-chlorobenzene. The pre
Photoelastic behavior of polystyrene and poly-α-methylstyrene
✍ Scribed by Rudd, J. F.
- Publisher
- Wiley (John Wiley & Sons)
- Year
- 1966
- Tongue
- English
- Weight
- 158 KB
- Volume
- 4
- Category
- Article
- ISSN
- 0449-2986
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## Abstract The photodegradation of thin films of poly‐α‐methylstyrene by near ultraviolet radiation has been studied in vacuum at 27 and 115°C. Changes taking place during photolysis were followed by a determination of monomer formation by ultraviolet spectroscopy, residue molecular weight through