## Abstract Titanium dioxide thin films were deposited near room temperature by plasma based ion implantation and deposition with the voltage pulses, accelerating the ions towards the substrate, ranging from 0 kV to 10 kV. Correspondingly, an increase of average energy per deposited particle from 2
β¦ LIBER β¦
Photocatalytic activity study of TiO2 thin films with and without Fe ion implantation
β Scribed by S.K. Zheng; T.M. Wang; C. Wang; G. Xiang
- Book ID
- 114165431
- Publisher
- Elsevier Science
- Year
- 2002
- Tongue
- English
- Weight
- 203 KB
- Volume
- 187
- Category
- Article
- ISSN
- 0168-583X
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