Photoacoustic and photoluminescence studies of porous silicon etched by low-concentration hydrofluoric acid
โ Scribed by T. Toyoda; T. Takahashi; Q. Shen
- Book ID
- 121664527
- Publisher
- American Institute of Physics
- Year
- 2000
- Tongue
- English
- Weight
- 351 KB
- Volume
- 88
- Category
- Article
- ISSN
- 0021-8979
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๐ SIMILAR VOLUMES
A novel hydrofluoric acid (HF) free atmospheric pressure chemical vapor deposition (APCVD) method has been developed to synthesize macropores on silicon. Field emission scanning electron microscopy (FESEM), X-ray powder diffraction (XRD) and energydispersive X-ray (EDX) spectrum indicate that the co
## Abstract Samples containing silicon nanowires (SiโNWs) and highly porous structures (PโSi) were prepared by electroless wet chemical etching (EWCE) of crystalline silicon wafers using various etching parameters. Photoluminescence (PL) measurements were performed with excitation at 488โnm and a p