Modeling of silicon atoms diffusion in G
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A.M Saad; O.I Velichko
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Article
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2004
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Elsevier Science
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English
β 273 KB
A simulation of Si diffusion in layer-doped GaAs crystals during annealing in the ambients with no excess of Ga or As and in As-rich conditions has been carried out. A model of diffusion due to ''silicon atom-gallium vacancy'' pairs taking into account the nonuniform distribution of point defects re