Phase-Field Simulation of Long-Wavelength Line Edge Roughness in Diblock Copolymer Resists
✍ Scribed by August W. Bosse
- Book ID
- 102497131
- Publisher
- John Wiley and Sons
- Year
- 2010
- Tongue
- English
- Weight
- 313 KB
- Volume
- 19
- Category
- Article
- ISSN
- 1022-1344
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✦ Synopsis
Abstract
We examine stochastic computer simulations of the Leibler‐Ohta‐Kawasaki (LOK) phase‐field model1, 2 and demonstrate that long‐wavelength line edge roughness (LER) and line width roughness (LWR) in a lamellar diblock copolymer resist depend monotonically on quench depth and noise strength, and that the LER and LWR spectra both exhibit a peak at k~0~–the characteristic wavenumber of mesophase separation in diblock copolymers. For k ⪅ k~0~, we find that the LER spectrum approximately scales like k^−1.6^. These observations are consistent with previous theoretical, computational, and experimental examinations LER and LWR in diblock copolymer melts, and thus the LOK phase‐field model should be considered a capable and appropriate framework for future examination of long‐wavelength LER and LWR in block copolymer resist systems.
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