## Abstract A phase field model of grain growth in thin films on rigid substrates is presented, in which the motion of grain boundaries is driven by curvatures as well as anisotropy in surface, interface, and strain energies. The match between the proposed model and the corresponding sharp interfac
Phase field modeling of growth competition of silicon grains
β Scribed by P. Chen; Y.L. Tsai; C.W. Lan
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 925 KB
- Volume
- 56
- Category
- Article
- ISSN
- 1359-6454
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β¦ Synopsis
The growth competition of two grains, with orientations (1 1 0) and (1 0 0), during directional solidification of silicon is simulated by using a phase field model. The two-dimensional simulations show two distinct competition mechanisms, with either interfacial or kinetic dominance, depending on the undercooling. At low undercooling, the interfacial effect is dominant so that (1 1 0) grain grows laterally, expelling the other grain. On the other hand, at high undercooling, the grain competition follows the same pattern at the beginning, but the (1 0 0) grain eventually becomes dominant, expanding its domain. In addition, the facet vanishing process and the dihedral angle evolution are discussed. The simulated results and phenomena are consistent with the experimental observations of Fujiwara et al. [
π SIMILAR VOLUMES
Models of normal grain growth can either start from a postulated kinetic law for individual grains and yield a distribution of grain sizes or they can start from a postulated distribution and the kinetic law may be derived. Both methods are studied and a whole family of distributions based on new ki