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Performance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO2 gate dielectrics

✍ Scribed by Min Yang, ; Gusev, E.P.; Meikei Ieong, ; Gluschenkov, O.; Boyd, D.C.; Chan, K.K.; Kozlowski, P.M.; D'Emic, C.P.; Sicina, R.M.; Jamison, P.C.; Chou, A.I.


Book ID
120177764
Publisher
IEEE
Year
2003
Tongue
English
Weight
266 KB
Volume
24
Category
Article
ISSN
0741-3106

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