✦ LIBER ✦
Performance and reliability of low-temperature polysilicon TFT with a novel stack gate dielectric and stack optimization using PECVD nitrous oxide plasma
✍ Scribed by Kow-Ming Chang; Wen-Chih Yang; Chiu-Pao Tsai
- Book ID
- 114617293
- Publisher
- IEEE
- Year
- 2004
- Tongue
- English
- Weight
- 479 KB
- Volume
- 51
- Category
- Article
- ISSN
- 0018-9383
No coin nor oath required. For personal study only.