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Percolation View of Novolak Dissolution. 5. The Dissolution of Exposed Resist Films

✍ Scribed by Shih, Hsiao-Yi; Reiser, Arnost

Book ID: 126808798
Publisher: American Chemical Society
Year: 1996
Tongue: English
Weight: 275 KB
Volume: 29
Category: Article
ISSN: 0024-9297
DOI: 10.1021/ma951668e

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