Patterning Layered Polymeric Multilayer Films by Room-Temperature Nanoimprint Lithography

✍ Scribed by Yingxi Lu; Wei Hu; Ying Ma; Lianbin Zhang; Junqi Sun; Nan Lu; Jiacong Shen

• Book ID: 102491513
• Publisher: John Wiley and Sons
• Year: 2006
• Tongue: English
• Weight: 339 KB
• Volume: 27
• Category: Article
• ISSN: 1022-1336
• DOI: 10.1002/marc.200500834

✦ Synopsis

Abstract

Summary: Polyelectrolyte multilayer films of poly(acrylic acid) (PAA)/poly(allylamine hydrochloride) (PAH) and PAH/poly(sodium 4‐styrenesulfonate) (PSS) based on electrostatic interactions as a driving force are patterned by room‐temperature nanoimprint lithography (RT‐NIL). Under an imprinting pressure of 40 bar for 8 min, well‐defined pattern structures with a line width of __≈__330 nm and a separation of __≈__413 nm are achieved. Meanwhile, hydrogen‐bonding‐directed multilayer films of poly(vinyl pyrrolidone) (PVPON)/poly(methyl acrylic acid) (PMAA) and poly(4‐vinylpyridine)/PAA can also be patterned in a similar way by RT‐NIL. The successful imprinting of these films originates from the high compressibility and fluidity of the layered polymeric films under high pressure.

SEM image of an imprinted (PAH/PAA)*20 film on silicon wafer.

magnified imageSEM image of an imprinted (PAH/PAA)*20 film on silicon wafer.