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Patterned sputter deposited SmCo-films for MEMS applications

โœ Scribed by T. Budde; H.H. Gatzen


Book ID
114225540
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
120 KB
Volume
242-245
Category
Article
ISSN
0304-8853

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โœ H Kattelus; J Koskenala; A Nurmela; A Niskanen ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 707 KB

Sputter-deposited metallic thin films are attractive materials for micromechanics but they suffer from large stress variations within the batch or even a single wafer. The origin of such variations is in the microcrystalline structure, and specifically its dependence on sputtering geometry. It might