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Particle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry

✍ Scribed by Vanhove, N.; Lievens, P.; Vandervorst, W.


Book ID
126184989
Publisher
The American Physical Society
Year
2009
Tongue
English
Weight
235 KB
Volume
79
Category
Article
ISSN
1098-0121

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