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Partially carboxymethylated novolaks for photoresist systems: New photoresists for development under mildly alkaline conditions

✍ Scribed by U. Westerwelle; G. Bähr; G. Grützner; F. Reuther


Book ID
114155804
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
282 KB
Volume
41-42
Category
Article
ISSN
0167-9317

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