Modeling of microstructural evolution during thin-film deposition requires a knowledge of several key activation energies (surface diffusion, island edge atom diffusion, adatom migration over descending step edges, etc.). These and other parameters must be known as a function of crystal orientation.
Parallelization of a level set method for simulating dendritic growth
β Scribed by Kai Wang; Anthony Chang; Laxmikant V. Kale; Jonathan A. Dantzig
- Book ID
- 108191907
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 389 KB
- Volume
- 66
- Category
- Article
- ISSN
- 0743-7315
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