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Oxygen plasma pre-treatments for high quality homoepitaxial CVD diamond deposition

✍ Scribed by Tallaire, A. ;Achard, J. ;Silva, F. ;Sussmann, R. S. ;Gicquel, A. ;Rzepka, E.


Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
186 KB
Volume
201
Category
Article
ISSN
0031-8965

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## Abstract The progress that has been achieved over the past few years on the growth of thick and high purity homo‐epitaxial single crystal diamond by chemical vapour deposition (CVD) has opened a wide range of possible applications in areas such as optics or power electronics. Recently, high qual