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Oxidation of thin films of tin at room temperature in hydrogen sulphide atmosphere

โœ Scribed by C I Muneera; V Unnikrishnan Nayar

Book ID
112845008
Publisher
Springer-Verlag
Year
1984
Tongue
English
Weight
718 KB
Volume
6
Category
Article
ISSN
0250-4707

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In-situ and real time room temperature o
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โœ S. Logothetidis; A. Barborica ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 459 KB

In-situ and real time ellipsometry was used to study the oxidation process of thin fcc TiN x films. The films were grown by DC reactive magnetron sputtering at various negative bias voltages (V b) in order to deposit TiN x with different stoichiometries and then exposed to several gases and to air a