Oxidation of ternary TiZrN hard coatings studied by XPS

✍ Scribed by Milošev, I.; Strehblow, H.-H.; Navinšek, B.

• Book ID: 101222432
• Publisher: John Wiley and Sons
• Year: 1998
• Tongue: English
• Weight: 280 KB
• Volume: 26
• Category: Article
• ISSN: 0142-2421
• DOI: 10.1002/(sici)1096-9918(199804)26:4<242::aid-sia367>3.0.co;2-y

✦ Synopsis

Electrochemical and thermal oxidation of TiZrN hard coatings deposited by the plasma beam sputtering technique are investigated using x-ray photoelectron spectroscopy (XPS). Ternary TiZrN coatings are found to be more susceptible towards oxidation compared to binary TiN and ZrN coatings. Electrochemical oxidation results in the formation of a mixed Ti(N,O) + Zr(N,O) oxynitride layer in the lower potential range (up to 1.1 V), whereas at higher potentials a mixed oxide layer is formed. This layer still incorporates a certain amount of TiO 2 + ZrO 2 nitrogen released during transformation of nitride to oxide. A similar is observed in the case of thermal oxidation at 350-600 ÄC, where the main product is a mixed layer. Nitrogen, which should normally be TiO 2 + ZrO 2 evolved during oxidation, remains incorporated in the growing oxide layer. No tendency towards alternate layer formation, i.e. was observed under the experimental conditions investigated. 1998 John Wiley & ZrO 2 /TiO 2 , ( Sons, Ltd.