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Oxidation of Polycrystalline Copper Thin Films at Ambient Conditions

✍ Scribed by Platzman, I.; Brener, R.; Haick, H.; Tannenbaum, R.

Book ID: 121272845
Publisher: American Chemical Society
Year: 2008
Tongue: English
Weight: 222 KB
Volume: 112
Category: Article
ISSN: 1932-7447
DOI: 10.1021/jp076981k

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## Abstract The local structure of very thin films of iron, deposited in an ultrahigh vacuum (UHV) onto polycrystalline copper and submitted to oxidation and thermal treatments, has been studied by surface electron energy‐loss fine structure (SEELFS) spectroscopy in reflection mode beyond the L~2,3