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Oxidation effects on transport characteristics of nanoscale MOS capacitors with an embedded layer of silicon nanocrystals obtained by low energy ion implantation

✍ Scribed by J. Grisolia; M. Shalchian; G. BenAssayag; H. Coffin; C. Bonafos; S. Schamm; S.M. Atarodi; A. Claverie


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
262 KB
Volume
124-125
Category
Article
ISSN
0921-5107

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