𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Origin of enhanced Ge interdiffusion at the initial stage of Ge deposition on Si(5 5 12)-2 × 1: Tensile stress induced by substrate chain structures

✍ Scribed by Hidong Kim; Otgonbayar Dugerjav; Ganbat Duvjir; Huiting Li; Jae M. Seo


Book ID
116896885
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
820 KB
Volume
606
Category
Article
ISSN
0039-6028

No coin nor oath required. For personal study only.