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Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene−Polydimethylsiloxane Block Copolymer

✍ Scribed by Jung, Yeon Sik; Ross, C. A.

Book ID: 120388213
Publisher: American Chemical Society
Year: 2007
Tongue: English
Weight: 732 KB
Volume: 7
Category: Article
ISSN: 1530-6984
DOI: 10.1021/nl070924l

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