Low-temperature MOCVD of chromium carbon
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Francis Maury; Franco Ossola
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Article
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1998
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John Wiley and Sons
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English
โ 220 KB
Amorphous chromium carbonitride coatings with a low nitrogen content (3-8 at%) were deposited by low-pressure MOCVD in the temperature range 573-793 K using Cr(NEt 2 ) 4 as single-source precursor. This poor nitrogen incorporation is in agreement with the trends predicted by thermochemical calculati