𝔖 Bobbio Scriptorium
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Optimum switching time for a beam-size switch (250 nm ⇔ 1000 nm) in a vector scan electron beam lithography machine

✍ Scribed by E. Koets; P. Kruit; T. Chisholm


Book ID
103599265
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
431 KB
Volume
23
Category
Article
ISSN
0167-9317

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