𝔖 Bobbio Scriptorium
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Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications

✍ Scribed by D. Kontziampasis; K. Beltsios; E. Tegou; P. Argitis; E. Gogolides


Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
854 KB
Volume
117
Category
Article
ISSN
0021-8995

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