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Optimized Ni Oxidation in 80-nm Contact Holes for Integration of Forming-Free and Low-Power Ni/NiO/Ni Memory Cells

✍ Scribed by Goux, L.; Lisoni, J.G.; Xin Peng Wang; Jurczak, M.; Wouters, D.J.


Book ID
114619742
Publisher
IEEE
Year
2009
Tongue
English
Weight
400 KB
Volume
56
Category
Article
ISSN
0018-9383

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