Optimized condition for etching fused-silica phase gratings with inductively coupled plasma technology

✍ Scribed by Wang, Shunquan ;Zhou, Changhe ;Ru, Huayi ;Zhang, Yanyan

• Book ID: 115352220
• Publisher: The Optical Society
• Year: 2005
• Tongue: English
• Weight: 538 KB
• Volume: 44
• Category: Article
• ISSN: 1559-128X
• DOI: 10.1364/AO.44.004429