𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Optimization of the surface texture for silicon carbide sliding in water

✍ Scribed by Xiaolei Wang; Koshi Adachi; Katsunori Otsuka; Koji Kato

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
586 KB
Volume
253
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Role of surface texturization in the for
Role of surface texturization in the formation of highly luminescent, stable and thick porous silicon films
✍ Shailesh N. Sharma; G. Bhagavannarayana; R.K. Sharma; S.T. Lakshmikumar πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 347 KB

Porous silicon (PS) films were prepared by anodization on polished and textured substrates of (1 0 0) Si at different current densities for a fixed anodization time of 30 min. Using scanning electron microscopy (SEM), high-resolution X-ray diffractometry (HRXRD) and photoluminescence (PL) decay meas

The role of atmospheric oxygen and water
The role of atmospheric oxygen and water in the generation of water marks on the silicon surface in cleaning processes
✍ M. Watanabe; M. Hamano; M. Harazono πŸ“‚ Article πŸ“… 1989 πŸ› Elsevier Science 🌐 English βš– 437 KB

Water marks are one of the most common contamination problems, which induce various' kinds" of device defects in (LSI) technology. Water marks have been attributed to residues of water used in the cleaning process. However, the purity of deionized water used in LSI fabrication today is extremely hig