Optimization of the InP/SiO2 interface treatment by (NH4)2Sx for the InP MISFET fabrication technology

✍ Scribed by Mathieu Petitjean; Nicole Proust; Jean-François Chapeaublanc; Jérôme Perrin

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 523 KB
• Volume: 33
• Category: Article
• ISSN: 0924-4247
• DOI: 10.1016/0924-4247(92)80221-n