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Optimization of the contact resistance in the interface structure of n-type Al/a-SiC:H by thermal annealing for optoelectronics applications

✍ Scribed by Ambrosio, Roberto ;Torres, Alfonso ;Zuñiga, Carlos ;Moreno, Mario ;Mireles, Jose


Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
227 KB
Volume
207
Category
Article
ISSN
0031-8965

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