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Optimization of process parameters for the electrical properties in Ga-doped ZnO thin films prepared by r.f. magnetron sputtering

โœ Scribed by Zhu, D.L.; Wang, Q.; Han, S.; Cao, P.J.; Liu, W.J.; Jia, F.; Zeng, Y.X.; Ma, X.C.; Lu, Y.M.


Book ID
121787239
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
1019 KB
Volume
298
Category
Article
ISSN
0169-4332

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