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Optimization of plasma parameters for high rate deposition of titanium nitride films as protective coating on bell-metal by reactive sputtering in cylindrical magnetron device

✍ Scribed by Sankar Moni Borah; Arup Ratan Pal; Heremba Bailung; Joyanti Chutia


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
394 KB
Volume
254
Category
Article
ISSN
0169-4332

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