Optimization of low pressure silicon nitride film growth from dichlorosilane and ammonia in integrated circuit manufacture

✍ Scribed by G. Peev; L. Zambov

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 442 KB
• Volume: 203
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(91)90528-6