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Optimization of gate oxide N2O anneal for CMOSFET's at room and cryogenic temperatures

โœ Scribed by Zhi-Jian Ma; Zhi Hong Liu; Krick, J.T.; Huang, H.J.; Cheng, Y.C.; Chenming Hu; Ko, P.K.


Book ID
114535786
Publisher
IEEE
Year
1994
Tongue
English
Weight
898 KB
Volume
41
Category
Article
ISSN
0018-9383

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