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Optimization of electrochemical track etching for alpha particle spectrometry

โœ Scribed by G.M. Hassib; H.A. Amer

Publisher
Elsevier Science
Year
1993
Weight
191 KB
Volume
22
Category
Article
ISSN
0969-8078

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๐Ÿ“œ SIMILAR VOLUMES

Effect of pre-etching on the registratio
Effect of pre-etching on the registration in CR-39 of electrochemically-etched tracks of protons and alpha particles of different energies
โœ W.G. Cross; A. Arneja; H. Ing ๐Ÿ“‚ Article ๐Ÿ“… 1984 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 348 KB

The amount of pre-etchlng needed to register electrochemlcally-etched (ECE) tracks efficiently in CR-39 varies with the particle LET. This dependence was studied for monoenergetlc alpha particles from i to 5.5 MeV and protons from 0.4 to 13.8 MeV. Pre-etchlng must be between upper and lower limits,