Optimization of an inductively coupled plasma etching process of GaInP∕GaAs based material for photonic band gap applications

✍ Scribed by Combrié, S.; Bansropun, S.; Lecomte, M.; Parillaud, O.; Cassette, S.; Benisty, H.; Nagle, J.

• Book ID: 121684872
• Publisher: AVS (American Vacuum Society)
• Year: 2005
• Tongue: English
• Weight: 487 KB
• Volume: 23
• Category: Article
• ISSN: 0734-211X
• DOI: 10.1116/1.1993617