Optically absorbing trilayer films fabricated using a Filtered Cathodic Vacuum Arc

✍ Scribed by Abaffy, N. Biluš ;Partridge, J. G. ;Plessis, J. du ;McCulloch, D. G.

• Book ID: 105364800
• Publisher: John Wiley and Sons
• Year: 2008
• Tongue: English
• Weight: 270 KB
• Volume: 205
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200778103

✦ Synopsis

Abstract

A Filtered Cathodic Vacuum Arc (FCVA) deposition system has been used to produce Al~2~O~3~/Al/Al~2~O~3~ trilayers for use as optically absorbing coatings. Ellipsometry was used to measure the optical constants of the AlO__~x~__ films and X‐ray photoelectron spectroscopy (XPS) was used to measure their stoichiometry. It was found that a wide range of Ar/O~2~ inlet flow‐rates could be used to produce stoichiometric Al~2~O~3~ in the FCVA system. Several Al~2~O~3~/Al/Al~2~O~3~ tri‐layers have been produced with different Al layer thicknesses and the simulated and experimental reflection characteristics have been compared. An average reflectance of 4% was achieved over the visible spectrum for the optimised trilayer coating deposited on silicon. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)