## Abstract A comprehensive characterization of the optical properties of wurtzite InN films grown by molecular beam epitaxy on Si(111) substrates is presented. Two types of films are investigated in this work: InN on AlN/Si(111) and InN on GaN/AlN/Si(111). Their properties are compared to a layer
Optical properties of InN grown on templates with controlled surface polarities
✍ Scribed by Kirste, Ronny ;Wagner, Markus R. ;Schulze, Jan H. ;Strittmatter, Andre ;Collazo, Ramon ;Sitar, Zlatko ;Alevli, Mustafa ;Dietz, Nikolaus ;Hoffmann, Axel
- Publisher
- John Wiley and Sons
- Year
- 2010
- Tongue
- English
- Weight
- 236 KB
- Volume
- 207
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
Abstract
The structural and optical properties of InN layers grown on GaN/sapphire templates with controlled Ga‐/N‐polar surfaces are investigated. Raman spectroscopy and XRD reciprocal space map analysis suggest that the InN layers were grown strain free with a high crystal quality. A line shape analysis of the A~1~(LO) Raman mode yields to a decreasing carrier concentration for the sample grown on Ga‐polar substrate. Low temperature photoluminescence measurements exhibit a shift to lower energies of the luminescence maximum for the sample grown on Ga‐polar GaN probably due to a reduced carrier concentration and thus, a decreased Burstein–Moss shift. Following this, we demonstrate that the use of polarity controlled GaN/sapphire substrates leads to unstrained layers with good structural and optical properties.
📜 SIMILAR VOLUMES
## Abstract Structural and luminescence properties of In‐rich In__~x~__ Ga~1−__x__~ N (0.71 ≤ __x__ ≤ 1) layers are comprehensively studied. The layers were grown on (0001) sapphire substrates by radio‐frequency plasma‐assisted molecular‐beam epitaxy, employing two types of underlying structures: l