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Optical Properties of Highly Fluorinated and Photosensitive Organically-Modified Silica Films for Integrated Optics

โœ Scribed by G.R. Atkins; R.B. Charters

Book ID
110398876
Publisher
Springer
Year
2003
Tongue
English
Weight
107 KB
Volume
26
Category
Article
ISSN
0928-0707

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UV photosensitivity of Ge-doped silica films deposited on Si (1 0 0) substrates using flame hydrolysis deposition (FHD) has been investigated. The ratio of Ge and Si of the sample was estimated by XPS as 10:90, and it was shown by AFM as smooth and homogeneous. It seems to have not germanium oxygen