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Optical properties of a highly boron-doped silicon surface

✍ Scribed by Hall, Jr., Joseph F.


Book ID
115379486
Publisher
Optical Society of America
Year
1960
Weight
361 KB
Volume
50
Category
Article
ISSN
0030-3941

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## Abstract Boron‐doped nanocrystalline silicon (nc‐Si:H) films were deposited by plasma‐enhanced chemical vapor deposition (PECVD). A variety of techniques, including X‐ray diffraction (XRD), Raman scattering (RS), UV–Vis–NIR spectroscopy and conductivity measurement were used to characterize the